What's the difference between lithography and photolithography?

Lithography


Definition:

  • (n.) The art or process of putting designs or writing, with a greasy material, on stone, and of producing printed impressions therefrom. The process depends, in the main, upon the antipathy between grease and water, which prevents a printing ink containing oil from adhering to wetted parts of the stone not covered by the design. See Lithographic limestone, under Lithographic.

Example Sentences:

  • (1) We have established a synchrotron-based system for radiation biology studies using the ES-0 exposure station of the Center for X-ray Lithography at the University of Wisconsin Synchrotron Radiation Center storage ring, Aladdin.
  • (2) The emerging technology of soft x-ray lasers has novel applications to microscopy, lithography, and other fields.
  • (3) Synthetic polypeptides, polylysine, were constructed in patterns with dimensions that approached the practical limit of resolution for optical lithography at 1-2 microns.
  • (4) Physiognomy found acceptance in the medicine of modern times, particularly through the publications of Johann Caspar Lavater (1741-1801), Carl Gustav Carus (1789-1869) and then, after 1838, of Karl Heinrich Baumgärtner (1798-1886) who took advantage of lithography, which had just come into use, to reproduce pictures of patients.
  • (5) After mentioning the numerous designs done by Henri Toulouse-Lautrec, in 1891, in Péan's surgical department, the author presents and explains a lithography published in 1897 in Georges Clemenceau's book "Au pied du Sinaï".
  • (6) You did painting, pottery, sculpture, lithography, lettering, art history and, above all, life drawing – which was immensely good news.
  • (7) The scanning probe microscope has found applications in metrology, spectroscopy, and lithography.
  • (8) Offset lithography was associated with the problem in 18 of the 21 cases.

Photolithography


Definition:

  • (n.) The art or process of producing photolithographs.

Example Sentences:

  • (1) Photolithography was used to prepare photoresist-based and silicon dioxide-silicon substrata with grooves of approximately 2 and approximately 0.5 micron deep, respectively.
  • (2) Solid-phase chemistry, photolabile protecting groups, and photolithography have been combined to achieve light-directed, spatially addressable parallel chemical synthesis to yield a highly diverse set of chemical products.
  • (3) This paper gives an overview of occupational health hazards resulting from production materials in the microelectronics industry and from waste products originating as gases from plasma etching processes in photolithography during semiconductor production.
  • (4) Grooves were formed in the (100) crystalline surface by means of photolithography and orientation-dependent etching.
  • (5) In clean rooms of the system of electronics are carried out work-physiological examinations on two basic professional groups--working in photolithography and operators.
  • (6) A set of microtextured silicone surfaces was manufactured using the technique of photolithography.
  • (7) The electrodes are fabricated using photolithography in patterned layers totaling 17 micron thick and 114 micron wide in the recording section.